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Journal Article (73)

  1. 61.
    Journal Article
    Zhang, Y.; Beuermann, T.; Stuke, M.: UV laser photofragment GaCH3 detected by far UV laser mass spectrometry. Applied Physics B 48, pp. 97 - 100 (1989)
  2. 62.
    Journal Article
    Zhang, Yanoing; Stuke, M.: UV excimer laser photochemistry of gaseous and surface adsorbed organometallics. Journal of Crystal Growth 93 (1-4), pp. 143 - 150 (1988)
  3. 63.
    Journal Article
    Zhang, Y.; Stuke, M.: Laser mass spectrometric detection of AlH molecules as collision-free excimer laser photoproducts from aluminum alkyls. Chemical Physics Letters 149 (3), pp. 310 - 315 (1988)
  4. 64.
    Journal Article
    Zhang, Y.; Stuke, M.: Laser multiphoton ionization spectrum of AlCH3 radicals formed by UV excimer laser photolysis of gaseous TMA at 248 nm and 193 nm. Japanese Journal of Applied Physics 27 (2), 7 (1988)
  5. 65.
    Journal Article
    Gottsleben, O.; Stuke, M.: Selective amplification of self‐resistively heated laser‐direct‐written tungsten lines. Applied Physics Letters 52 (26), pp. 2230 - 2232 (1988)
  6. 66.
    Journal Article
    Küper, S.; Stuke, M.: Femtosecond uv excimer laser ablation. Applied Physics B 44 (4), pp. 199 - 204 (1987)
  7. 67.
    Journal Article
    Löhmannsroeben, H. G.; Luther, K.; Stuke, M.: Lifetimes of vibrationally excited triplet alkylbenzenes studied by two-color photoionization. Journal of Physical Chemistry 91 (13), pp. 3499 - 3503 (1987)
  8. 68.
    Journal Article
    Larciprete, R.; Stuke, M.: Direct observation of excimer-laser photoablation products from polymers by picosecond-uv-laser mass spectroscopy. Applied physics. B, Photophysics and laser chemistry 42 (3), pp. 181 - 184 (1987)
  9. 69.
    Journal Article
    Larciprete, R.; Stuke, M.: Isotope selective ionization of tellurium dimers Te2 formed by excimer laser photodissociation of an organometallic compound: CH3TeTeCH3. Applied Physics B 41 (4), pp. 213 - 215 (1986)
  10. 70.
    Journal Article
    Larciprete, R.; Stuke, M.: Excimer-laser-induced photochemistry of organometallic compounds monitored by dye laser mass spectroscopy: Dimethyl ditelluride (CH3TeTeCH3). Journal of Physical Chemistry 90 (19), pp. 4568 - 4573 (1986)
  11. 71.
    Journal Article
    Larciprete, R.; Stuke, M.: Excimer laser photolysis of organometallic compounds monitored by laser mass spectroscopy. Journal of Crystal Growth 77 (1-3), pp. 235 - 240 (1986)
  12. 72.
    Journal Article
    Fantoni, R.; Stuke, M.: Laser multiphoton mass spectroscopy of organometallic compounds: State selective and mass resolved detection of neutral fragment tellurium atoms from C2H5TeC2H5. Applied Physics B 38 (4), pp. 209 - 218 (1985)
  13. 73.
    Journal Article
    Stuke, M.: Ultrasensitive fingerprint detection of organometallic compounds by laser multiphoton ionization mass spectrometry. Applied Physics Letters 45 (11), pp. 1175 - 1177 (1984)

Book (2)

  1. 74.
    Book
    Boyd, I. W.; Perriere, J.; Stuke, M.: Surface processing: Laser, lamp, plasma. Applied Surface Science 139,. Elsevier Science, Oxford (1999)
  2. 75.
    Book
    Horwitz, J. S.; Krebs, H. U.; Murakami, K.; Stuke, M.: Laser Ablation. Springer, New York (1999)

Conference Paper (2)

  1. 76.
    Conference Paper
    Stuke, M.: Uv laser photochemistry of organometallics for surface processing. Abstracts of Papers of the American Chemical Society 200, p. 195 - 195 (1990)
  2. 77.
    Conference Paper
    Stuke, M.: Laser mass-spectroscopy of laser etching and CVD processes. Journal of Electrochemical Society 134 (8B), p. C432 - C432 (1987)
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